‘Highly-parallel’ manufacturing techniques promise to cut the cost of electronics by rapidly and simultaneously producing identical devices. Metrological tools are needed to improve current manufacturing processes to ensure high resolution of features on large surfaces.
Developments have enabled innovation and efficiency gains for production of photovoltaics, self-cleaning surfaces and instant disposable medical tests.
A nanostructure inspection demonstrator and new areal standard calibration artefacts for measuring surface texture have been developed in EMPIR project Metrology for highly-parallel manufacturing (14IND09 MetHPM) and can be seen at CIM 2017.
These instruments and other innovative devices will be demonstrated on the EURAMET stand at the 18th International Metrology Congress (CIM 2017) on the 19 to 21 September 2017.
The full congress programme and registration details can be found on the congress website.
Visit EURAMET at CIM 2017 to see this and other innovative devices.